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Title High-k gate dielectrics for CMOS technology [electronic resource] / edited by Gang He and Zhaoqi Sun.
Publication Info. Weinheim : Wiley-VCH, 2012.

Location Call No. Status Notes
 Libraries Electronic Books  ELECTRONIC BOOK-Ebook Central Academic Complete    AVAIL. ONLINE
Description xxxi, 558 p. : ill. (some col.)
Bibliography Includes bibliographical references and index.
Contents pt. 1. Scaling and challenging of Si-based CMOS -- pt. 2. High-k deposition and materials characterization -- pt. 3. Challenge in interface engineering and electrode -- pt. 4. Development in non-Si-based CMOS technology -- pt. 5. High-k Application in novel devices -- pt. 6. Challenge and directions.
Reproduction Electronic reproduction. Ann Arbor, MI : ProQuest, 2015. Available via World Wide Web. Access may be limited to ProQuest affiliated libraries.
Subject Dielectrics.
Metal oxide semiconductors, Complementary.
Added Author He, Gang.
Sun, Zhaoqi.
ProQuest (Firm)
ISBN 9783527330324
9783527646371 (e-book)
OCLC # EBC956000
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