| Description |
xxxi, 558 p. : ill. (some col.) |
| Bibliography |
Includes bibliographical references and index. |
| Contents |
pt. 1. Scaling and challenging of Si-based CMOS -- pt. 2. High-k deposition and materials characterization -- pt. 3. Challenge in interface engineering and electrode -- pt. 4. Development in non-Si-based CMOS technology -- pt. 5. High-k Application in novel devices -- pt. 6. Challenge and directions. |
| Reproduction |
Electronic reproduction. Ann Arbor, MI : ProQuest, 2015. Available via World Wide Web. Access may be limited to ProQuest affiliated libraries. |
| Subject |
Dielectrics.
|
|
Metal oxide semiconductors, Complementary.
|
| Added Author |
He, Gang.
|
|
Sun, Zhaoqi.
|
|
ProQuest (Firm)
|
| ISBN |
9783527330324 |
|
9783527646371 (e-book) |
| OCLC # |
EBC956000 |
|
